Photocarrier dynamic measurement of rutile TiO2 films prepared by RF magnetron reactive sputtering

JOURNAL OF ALLOYS AND COMPOUNDS

卷:701

Article

Wan, Guangmiao¹  Wang, Shenwei¹  Li, Ling¹  Mu, Guangyao¹  Yin, Xue¹  Zhang, Xinwu¹  Tang, Ying²  Yi, Lixin¹ 

[1] Beijing Jiaotong Univ, Inst Optoelect Technol, Minist Educ, Key Lab Luminescence & Opt Informat, Beijing 100044, Peoples R China

[2] Beijing Jiaotong Univ, Sch Sci, Beijing 100044, Peoples R China

关键词: Rutile titanium dioxide;    Sputtering;    Thin films;    Carrier dynamics;    Free carrier absorption;   

DOI  :  10.1016/j.jallcom.2017.01.146

来源: Elsevier

【 摘 要 】

In this work, rutile titanium dioxide (TiO2) films were prepared on quartz and SiO2/Si substrates utilizing RF magnetron reactive sputtering technology. Crystal structure, surface morphology and optical property of these films were characterized to verify the obtainment of well crystalline rutile TiO2 films. The dynamics of photocarriers were studied by using temporally resolved transient absorption measurements. The differential reflectivity as a function of pump fluence was investigated. We also directly obtained a carrier lifetime of about 286 ps. The absorption cross-section and the absorption coefficient of free carrier at 800 nm were 1.87 x 10(-17) cm(2) and 32.9 cm(-1), respectively. (C) 2017 Elsevier B.V. All rights reserved.

【 授权许可】

Free