Level-set strategy for inverse DSA-lithography

JOURNAL OF COMPUTATIONAL PHYSICS

卷:375

Article

Ouaknin, Gaddiel Y.¹  Laachi, Nabil⁵  Delaney, Kris⁵  Fredrickson, Glenn H.^3,4,5  Gibou, Frederic^1,2 

[1] Univ Calif Santa Barbara, Dept Mech Engn, Santa Barbara, CA 93106 USA

[2] Univ Calif Santa Barbara, Dept Comp Sci, Santa Barbara, CA 93106 USA

[3] Univ Calif Santa Barbara, Dept Chem Engn, Santa Barbara, CA 93106 USA

[4] Univ Calif Santa Barbara, Dept Mat, Santa Barbara, CA 93106 USA

[5] Univ Calif Santa Barbara, Mat Res Lab, Santa Barbara, CA 93106 USA

关键词: Level-set;    SCFT;    Inverse problems;    DSA;    Lithography;    Shape optimization;   

DOI  :  10.1016/j.jcp.2018.09.021

来源: Elsevier

【 摘 要 】

We introduce a level-set strategy to find the geometry of confinement that will guide the self-assembly of block copolymers to a given target design in the context of lithography. The methodology is based on a shape optimization algorithm, where the level-set normal velocity is defined as the pressure field computed through a self-consistent field theory simulation. We present numerical simulations that demonstrate that this methodology is capable of finding guiding templates for a variety of target arrangements of cylinders and thus is an effective approach to the inverse directed self-assembly problem. (C) 2018 Elsevier Inc. All rights reserved.

【 授权许可】

Free