Fuzzy tungsten in a magnetron sputtering device

JOURNAL OF NUCLEAR MATERIALS

卷:480

Article

Petty, T. J.¹  Khan, A.²  Heil, T.³  Bradley, J. W.¹ 

[1] Univ Liverpool, Dept Elect Engn & Elect, Brownlow Hill, Liverpool L69 3GJ, Merseyside, England

[2] Univ Manchester, Sch Mech Aerosp & Civil Engn, Pariser Bldg G11, Manchester M13 9PL, Lancs, England

[3] NiCaL, Block C Waterhouse Bldg,1-3 Brownlow St, Liverpool L69 3GL, Merseyside, England

关键词: Fuzzy tungsten;    Magnetron;    Helium;   

DOI  :  10.1016/j.jnucmat.2016.08.019

来源: Elsevier

【 摘 要 】

Helium ion induced tungsten nanostructure (tungsten fuzz) has been studied in a magnetron sputtering device. Three parameters were varied, the fluence from 3.4 x 10(23)-3.0 x 10(24) m(-2), the He ion energy from 25 to 70 eV, and the surface temperature from 900 to 1200 K. For each sample, SEM images were captured, and measurements of the fuzz layer thickness, surface roughness, reflectivity, and average structure widths are provided. A cross-over point from pre-fuzz to fully formed fuzz is found at 2.4 +/- 0.4 x 10(24) m(-2), and a temperature of 1080 +/- 60 K. No significant change was observed in the energy sweep. The fuzz is compared to low fluence fuzz created in the PISCES-A linear plasma device. Magnetron fuzz is less uniform than fuzz created by PISCES-A and with generally larger structure widths. The thicknesses of the magnetron samples follow the original phi(1/2) relation as opposed to the incubation fluence fit. Crown Copyright (C) 2016 Published by Elsevier B.V. All rights reserved.

【 授权许可】

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