Structure and thermal stability of ceria films supported on YSZ(100) and α-Al2O3(0001)

SURFACE SCIENCE

卷:592

Article

Costa-Nunes, O ; Ferrizz, RM ; Gorte, RJ ; Vohs, JM

关键词: ceria;    zirconia;    Al2O3;    X-ray photoelectron spectroscopy;    atomic force microscopy;   

DOI  :  10.1016/j.susc.2005.06.029

来源: Elsevier

【 摘 要 】

The morphology and reducibility of vapor-deposited ceria films supported on yttria-stabilized zirconia (100) (YSZ(1 0 0)) and alpha-Al2O3(0 0 0 1) single crystals were studied using X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFNI). The results of this study show that the gas environment has a significant effect on the structure of the ceria films on both substrates. CeO2 films on alpha-Al2O3(0 0 0 1) were found to be stable in a reducing environment at temperatures up to 1000 K, but underwent agglomeration and reaction with the support to form CeAlO3 upon annealing at 1273 K in air. Heating CeO2/YSZ(1 0 0) in air at 1273 K caused the ceria thin film to agglomerate into bar-shaped features which were re-dispersed by subsequent annealing in vacuum. Interactions at the CeO2 YSZ interface were also found to dramatically enhance the reducibility of ceria films supported on YSZ(1 0 0). (c) 2005 Elsevier B.V. All rights reserved.

【 授权许可】

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