Vacancy-mediated diffusion of Co atoms embedded in Cu(001)

SURFACE SCIENCE

卷:605

Article

van Gastel, Raoul¹  Van Moere, Ronald¹  Zandvliet, Harold J. W.¹  Poelsema, Bene¹ 

[1] Univ Twente, MESA Inst Nanotechnol, NL-7500 AE Enschede, Netherlands

关键词: Scanning tunneling microscopy (STM);    Cobalt;    Copper;    Surface structure;    Morphology;    Roughness and topography;    Diffusion;   

DOI  :  10.1016/j.susc.2011.07.011

来源: Elsevier

【 摘 要 】

The diffusion of Co atoms in the Cu(001) surface has been studied using Scanning Tunneling Microscopy (STM). Like other impurities in the Cu(001) surface, the diffusion of Co is mediated by single surface vacancies. STM images reveal that diffusion of the embedded atoms takes place through multi-atom jumps separated by long time intervals, which is characteristic for this type of diffusion. The jump length and frequency are measured to establish the nature of the interaction between surface vacancies and the embedded Co atoms and to extract the relevant formation and diffusion energies. (C) 2011 Elsevier B.V. All rights reserved.

【 授权许可】

Free