Formation of ordered and disordered interfacial films in immiscible metal alloys

SCRIPTA MATERIALIA

卷:130

Article

Pan, Zhiliang¹  Rupert, Timothy J.^1,2 

[1] Univ Calif Irvine, Dept Mech & Aerosp Engn, Irvine, CA 92697 USA

[2] Univ Calif Irvine, Dept Chem Engn & Mat Sci, Irvine, CA 92697 USA

关键词: Grain boundaries;    Interface structure;    Order-disorder phenomena;    Surface segregation;    Complexions;   

DOI  :  10.1016/j.scriptamat.2016.11.025

来源: Elsevier

【 摘 要 】

Atomistic simulations are used to study segregation-induced intergranular film formation in Cu-Zr and Cu-Nb alloys. While Cu-Zr forms structurally disordered or amorphous films, ordered films comprised of a second phase usually precipitate in Cu-Nb, with a critical nucleation size of similar to 1 nm below which the ordered phase cannot form. While the ordered film is retained at high temperature for a low energy Sigma 11 (113) boundary, a disordering transition is observed for a high energy Sigma 5 (310) boundary at low dopant concentrations. Finally, the effect of free surfaces on dopant segregation and intergranular film formation is investigated for both alloys. (C) 2016 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.

【 授权许可】

Free