Control of effective cooling rate upon magnetron sputter deposition of glassy Ge15Te85

SCRIPTA MATERIALIA

卷:178

Article

Pries, Julian¹  Wei, Shuai¹  Hoff, Felix¹  Lucas, Pierre²  Wuttig, Matthias^1,3 

[1] Rhein Westfal TH Aachen, Inst Phys IA, D-52074 Aachen, Germany

[2] Univ Arizona, Dept Mat Sci & Engn, Tucson, AZ 85712 USA

[3] Forschungszentrum Julich, Peter Grunberg Inst PGI 10, D-52428 Julich, Germany

关键词: Metastable phases;    Chalcogenide glasses;    Glass transition;    Fictive temperature;    Quenching;    Undercooling;   

DOI  :  10.1016/j.scriptamat.2019.11.024

来源: Elsevier

【 摘 要 】

Reducing the enthalpy of as-deposited amorphous films is desirable as it improves their kinetic stability and enhances the reliability of resulting devices. Here we demonstrate that Ge15Te85 glass films of lower enthalpy are produced by increasing the voltage during magnetron sputter deposition. An increase of similar to 100 V leads to a drop in effective cooling rate of almost three orders of magnitude, thereby yielding markedly lower enthalpy glasses. The sputtering voltage therefore constitutes a novel parameter for tuning the fictive temperature of glass films, which could help to obtain ultra-stable glasses in combination with substrate temperature control. (C) 2019 Acta Materialia Inc. Published by Elsevier Ltd.

【 授权许可】

Free