Surfactant Sputtering: Theory of a new method of surface nanostructuring by ion beams

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS

卷:267

Article; Proceedings Paper

Kree, R.¹  Yasseri, T.¹  Hartmann, A. K.² 

[1] Univ Gottingen, Inst Theoret Phys, D-37077 Gottingen, Germany

[2] Carl von Ossietzky Univ Oldenburg, Inst Phys, D-26111 Oldenburg, Germany

关键词: Ion-beam sputtering;    Pattern formation;    Surfactant sputtering;    Continuum theory;    Monte Carlo method;   

DOI  :  10.1016/j.nimb.2009.01.150

来源: Elsevier

【 摘 要 】

We present a new Monte Carlo model and a new continuum theory of surface pattern formation due to surfactant sputtering, i.e. erosion by ion beam sputtering including a submonolayer coverage of additional, co-sputtered surfactant atoms. This setup, which has been realized in recent experiments in a controlled way leads to a number of interesting possibilities to modify pattern forming processing conditions. We will present three simple scenarios, which illustrate some potential applications of the method. In all three cases, simple Bradley-Harper type ripples appear in the absence of surfactant, whereas new, interesting structures emerge during surfactant sputtering. (C) 2009 Elsevier B.V. All rights reserved.

【 授权许可】

Free