Applications of synchrotron X-rays in microelectronics industry research

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS

卷:241

Article; Proceedings Paper

Jordan-Sweet, JL ; Detavernier, C ; Lavoie, C ; Mooney, PM ; Toney, MF

关键词: microelectronics materials;    X-ray diffraction;    synchrotron;    nickel silicide;    strained silicon;    nanoparticles;   

DOI  :  10.1016/j.nimb.2005.07.031

来源: Elsevier

【 摘 要 】

The high flux and density of X-rays produced at synchrotrons provide the microelectronics industry with a powerful probe of the structure and behavior of a wide array of solid materials that are being developed for use in devices of the future. They also are of great use in determining why currently-used materials and processes sometimes fail. This paper describes the X20 X-ray beamline facility operated by IBM at the National Synchrotron Light Source, and presents a series of three industry challenges and results that illustrate the variety of techniques used and problems addressed. The value of this research ranges from solving short-term, technically specific problems to increasing our academic understanding of materials in general. Techniques discussed include high-resolution diffraction, time-resolved diffraction, texture measurements, and grazing-incidence diffraction. (c) 2005 Elsevier B.V. All rights reserved.

【 授权许可】

Free