Mo-containing tetrahedral amorphous carbon deposited by dual filtered cathodic vacuum arc with selective pulsed bias voltage

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS

卷:259

Article

Pasaja, Nitisak ; Sansongsiri, Sakon ; Intarasiri, Saweat ; Vilaithong, Thiraphat ; Anders, Andre

关键词: tetrahedral amorphous carbon;    metal doping filtered cathodic vacuum arc;    electrical resistivity;    profilometry;    Raman spectroscopy;    Rutherford backscattering;   

DOI  :  10.1016/j.nimb.2007.02.093

来源: Elsevier

【 摘 要 】

Metal-containing tetrahedral amorphous carbon films were produced by dual filtered cathodic vacuum arc plasma sources operated in sequentially pulsed mode. Negatively pulsed bias was applied to the substrate when carbon plasma was generated, whereas it was absent when the molybdenum plasma was presented. Film thickness was measured after deposition by profilometry. Glass slides with silver pads were used as substrates for the measurement of the sheet resistance. The microstructure and composition of the films were characterized by Raman spectroscopy and Rutherford backscattering, respectively. It was found that the electrical resistivity decreases with an increase of the Mo content, which can be ascribed to an increase of the sp(2) content and an increase of the sp2 cluster size. (c) 2007 Elsevier B.V. All rights reserved.

【 授权许可】

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