Kossel interferences of proton-induced X-ray emission lines to study thin film waveguides

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS

卷:452

Article

Zhang, J. P.^1,2  Pendenque, C.¹  Le Guen, K.¹  Delaunay, R.¹  Vickridge, I³  Schmaus, D.³  Fu, Q. G.²  Jonnard, P.¹ 

[1] Sorbonne Univ, CNRS, Lab Chim Phys Mat & Rayonnement, UMR 7614, 4 Pl Jussieu, F-75252 Paris 05, France

[2] Northwestern Polytech Univ, State Key Lab Solidificat Proc, Shaanxi Key Lab Fiber Reinforced Light Weight Com, Xian 710072, Shaanxi, Peoples R China

[3] Sorbonne Univ, CNRS, UMR 7588, Inst NanoSci Paris, 4 Pl Jussieu, F-75252 Paris 05, France

关键词: X-ray waveguide;    Thin film;    PIXE;    Kossel diffraction;    X-ray reflectometry;   

DOI  :  10.1016/j.nimb.2019.05.053

来源: Elsevier

【 摘 要 】

PIXE combined in Kossel geometry was developed as a non-destructive structural characterization method of nanometer thin films deposited on Si. The method is applied to study Pt/Fe/Pt and Ta/Cr/Pt thin films designed as X-ray planar waveguides. The intensities of characteristic X-ray emissions versus the detection angle (grazing exit), called Kossel curves, were measured by an energy dispersive X-ray camera. It is found that an interfacial compound is formed in Pt/Fe/Pt waveguide, whereas oxidation and mixing occur in the Ta/Cr/Pt system. It was not possible to obtain the description of the successive layers when considering only grazing incidence x-ray reflectivity. When PIXE-Kossel experiments are considered, supplementary constraints have to be fulfilled when fitting the values of the stack parameters (number, composition, thickness, roughness and density of the layers) which restrict the possible descriptions of waveguides. Thus PIXE-Kossel is suitable to characterize stacks of nanometer thin films designed as an x-ray waveguide.

【 授权许可】

Free