Effects of ion irradiation on chemical and mechanical properties of magnetron sputtered amorphous SiOC

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS

卷:446

Article

Zare, A.¹  Su, Q.²  Gigax, J.³  Shojaee, S. A.⁴  Harriman, T. A.¹  Nastasi, M.^2,5,6  Shao, L.³  Materer, N. F.⁷  Lucca, D. A.¹ 

[1] Oklahoma State Univ, Sch Mech & Aerosp Engn, Stillwater, OK 74078 USA

[2] Univ Nebraska, Nebraska Ctr Energy Sci Res, Lincoln, NE 68583 USA

[3] Texas A&M Univ, Dept Nucl Engn, College Stn, TX 77840 USA

[4] Amethyst Res Inc, 123 Case Circle, Ardmore, OK 73401 USA

[5] Univ Nebraska, Dept Mech & Mat Engn, Lincoln, NE 68583 USA

[6] Univ Nebraska, Nebraska Ctr Mat & Nanosci, Lincoln, NE 68588 USA

[7] Oklahoma State Univ, Dept Chem, Stillwater, OK 74078 USA

关键词: Ion irradiation;    Irradiation tolerant materials;    Pile-up;    Ripple formation;    Radial cracks;    Microindentation;   

DOI  :  10.1016/j.nimb.2019.03.009

来源: Elsevier

【 摘 要 】

Amorphous silicon oxycarbide (SiOC) films, fabricated by magnetron sputtering, were irradiated at room temperature with 3.5 MeV Fe ions to damage levels of 10, 20, and 50 displacements per atom (dpa). Irradiation-induced changes in the nature of the atomic bonds were studied using Raman spectroscopy and X-ray photo-electron spectroscopy. The chemical composition of the surfaces of the films remained relatively unchanged after ion irradiation. Surface topography of the films was studied by atomic force microscopy and it was found that ordered topographic patterns were formed on the surface of the irradiated films. Deformation behavior of the films was studied by a combination of nanoscratch experiments and in-situ scanning probe microscopy. No signs of cracks or chipping were observed around the scratches on the as-deposited and irradiated films. Furthermore, microindentation experiments with a Vickers indenter were performed on selected films and the impressions were studied by scanning electron microscopy. The film irradiated to 20 dpa showed an increased resistance to indentation cracking compared to the as-deposited film. The study demonstrates that amorphous SiOC, with desirable structural stability and mechanical properties, can be a promising candidate for irradiation tolerant materials.

【 授权许可】

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