Track-etched nanopores in spin-coated polycarbonate films applied as sputtering mask

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS

卷:267

Article; Proceedings Paper

Nix, A. -K.¹  Gehrke, H. -G.¹  Krauser, J.²  Trautmann, C.³  Weidinger, A.⁴  Hofsaess, H.¹ 

[1] Univ Gottingen, Inst Phys 2, D-37077 Gottingen, Germany

[2] Hsch Harz, Wernigerode, Germany

[3] Gesell Schwerionenforsch GSI, Darmstadt, Germany

[4] Hahn Meitner Inst Berlin GmbH, D-1000 Berlin, Germany

关键词: Polycarbonate;    Ion track;    Etching;    Sputtering;    Swift heavy ion irradiation;   

DOI  :  10.1016/j.nimb.2009.02.029

来源: Elsevier

【 摘 要 】

Thin polycarbonate films were spin-coated on silicon substrates and subsequently irradiated with 1-GeVU ions. The ion tracks in the polymer layer were chemically etched yielding nanopores of about 40 nnn diameter. In a second process, the nanoporous polymer film acted as mask for structuring the Si substrate underneath. Sputtering with 5-keV Xe ions produced surface craters of depth similar to 150 nnn and diameter similar to 80 nm. This arrangement can be used for the fabrication of track-based nanostructures with self-aligned apertures. (C) 2009 Elsevier B.V. All rights reserved.

【 授权许可】

Free