The influence of beam divergence on ion-beam induced surface patterns

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS

卷:267

Article; Proceedings Paper

Kree, R.¹  Yasseri, T.¹  Hartmann, A. K.² 

[1] Univ Gottingen, Inst Theoret Phys, D-37077 Gottingen, Germany

[2] Carl von Ossietzky Univ Oldenburg, Inst Phys, D-26111 Oldenburg, Germany

关键词: Ion-beam sputtering;    Pattern formation;    Beam divergence;    Continuum theory;    Monte Carlo method;   

DOI  :  10.1016/j.nimb.2009.01.064

来源: Elsevier

【 摘 要 】

We present a continuum theory and a Monte Carlo model of self-organized surface pattern formation by ion-beam sputtering including effects of beam profiles. Recently, it has turned out that such secondary ion-beam parameters may have a strong influence on the types of emerging patterns. We first discuss several cases, for which beam profiles lead to random parameters in the theory of pattern formation. Subsequently we study the evolution of the averaged height profile in continuum theory and find that the typical Bradley-Harper scenario of dependence of ripple patterns on the angle of incidence can be changed qualitatively. Beam profiles are implemented in Monte Carlo simulations, where we find generic effects on pattern formation. Finally, we demonstrate that realistic beam profiles, taken from experiments, may lead to qualitative changes of surface patterns. (C) 2009 Elsevier B.V. All rights reserved.

【 授权许可】

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