Fabrication of ultrathin films of Ta2O5 by a sol-gel method

THIN SOLID FILMS

卷:527

Article

Wolf, M. J.^1,2  Roitsch, S.²  Mayer, J.²  Nijmeijer, A.¹  Bouwmeester, H. J. M.¹ 

[1] Univ Twente, NL-7500 AE Enschede, Netherlands

[2] Res Ctr Julich, Ernst Ruska Ctr Microscopy & Spect Electrons, D-52425 Julich, Germany

关键词: Tantala;    Tantalum oxide;    Thin films;    Sol-gel;    Diffusion barrier;   

DOI  :  10.1016/j.tsf.2012.12.054

来源: Elsevier

【 摘 要 】

Tantalum oxide (Ta2O5) is widely known for its high chemical, thermal and hydrothermal stability. In this study, a sol-gel method has been developed to produce homogenous, i.e., defect and pin-hole free, ultrathin films of Ta2O5. These were coated onto a porous substrate by means of dip-coating, and subsequently fired at 400 degrees C. Despite their small thickness of only 30-40 nm, the films showed very low gas permeation. (C) 2012 Elsevier B.V. All rights reserved.

【 授权许可】

Free