Colloidal lithography and Metal-Organic Chemical Vapor Deposition process integration to fabricate ZnO nanohole arrays

THIN SOLID FILMS

卷:518

Article; Proceedings Paper

Fragala, Maria Elena^1,2  Satriano, Cristina^1,2  Aleeva, Yana³  Malandrino, Graziella^1,2 

[1] Univ Catania, Dipartimento Sci Chim, I-95127 Catania, Italy

[2] INSTM UdR Catania, Catania, Italy

[3] Scuola Super Univ Catania, Dipartimento Sci Chim, Catania, Italy

关键词: ZnO;    Catalyst;    Nanowires;    Nanohole array;    Colloidal lithography;    MOCVD;   

DOI  :  10.1016/j.tsf.2010.04.005

来源: Elsevier

【 摘 要 】

A complete set up of optimal process conditions for an effective colloidal lithography/catalyst assisted MOCVD process integration is presented. It mainly focuses on the determination of the deposition temperature threshold for ZnO Metal-Organic Chemical Vapour Deposition (MOCVD) as well as the concentration of metal-organic silver (Ag) catalyst. Indeed, the optimization of such process parameters allows to tailor the ZnO film morphology in order to make the colloidal lithography/catalyst assisted MOCVD approach a valuable bottom up method to fabricate bi-dimensional ordered ZnO nanohole arrays. (C) 2010 Elsevier B.V. All rights reserved.

【 授权许可】

Free