Low temperature ZnO films grown by successive ionic layer adsorption and reaction method

THIN SOLID FILMS

卷:663

Article

Alfaro Cruz, M. R.¹  Garza-Hernandez, R.²  Horley, P. P.²  Mata-Ramirez, J.³  Martinez-G, E.²  Aguirre-Tostado, F. S.² 

[1] CONACYT Univ Autonoma Nuevo Leon, Dept Ecomat & Energia, Fac Ingn Civil, Cd Univ, San Nicolas De Los Garza 66455, Nuevo Leon, Mexico

[2] Ctr Invest Mat Avanzados SC, Unidad Monterrey, Parque Invest & Innovac Tecnol,202 Alianza Norte, Apodaca 66628, Nuevo Leon, Mexico

[3] Univ Autonoma Baja California, Fac Ingn Arquitectura & Diseno, Carretera Transpeninsular Ensenada Tijuana 3917, Ensenada 22869, BC, Mexico

关键词: SILAR;    ZnO;    Thin films;    Structural properties;    Optical properties;    Surface morphology;   

DOI  :  10.1016/j.tsf.2018.08.005

来源: Elsevier

【 摘 要 】

Zinc oxide films with a high transmittance in the visible range (over 80%) were obtained by successive ionic layer adsorption and reaction method without thermal treatment, using only a low-temperature (125 degrees C) ethylene glycol bath to complete the reaction. It was shown that the film deposition rate, as well as its structural and optical properties can be adjusted by variation of NH4OH concentration in the precursor solution. All obtained films were of a uniform surface morphology with fine grains about 43-48 nm in size and larger flower-like surface formations. The complex multi-technique material characterization has shown that ZnO deposited from 1:20 ZnSO4:NH4OH precursor solution featured low content of residual phases, faster growing rate, higher c-axis orientation, and the highest transparency. At the same time, optical band gap of the samples (E-g approximate to 3.4 eV) showed no marked dependence on NH4OH concentration.

【 授权许可】

Free