A study of atomic layer deposited LiAlxOy films on Mg-Li alloys

THIN SOLID FILMS

卷:518

Article

Wang, P. C.¹  Shih, Y. T.¹  Lin, M. C.¹  Lin, H. C.¹  Chen, M. J.¹  Lin, K. M.² 

[1] Natl Taiwan Univ, Dept Mat Sci & Engn, Taipei 10617, Taiwan

[2] Feng Chia Univ, Dept Mat Sci & Engn, Taichung 40724, Taiwan

关键词: Atomic layer deposition;    LiAlxOy film;    Mg-Li alloy;    Corrosion resistance;   

DOI  :  10.1016/j.tsf.2010.05.033

来源: Elsevier

【 摘 要 】

LiAlxOy films with thicknesses of 65-200 nm were deposited by the atomic layer deposition (ALD) technique on the LZ101 Mg-Li alloy. The ALD-deposited LiAlxOy films exhibit an amorphous structure and have an atomic ratios of Li:Al:O=1:1:2. The potentio-dynamic polarization tests show that the corrosion resistance of Mg-Li alloys can be significantly improved due to the dense and pinhole-free structure as well as the excellent coverage and conformity of the ALD-deposited LiAlxOy films. (C) 2010 Elsevier B.V. All rights reserved.

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