Structure and composition of sputter-deposited nickel-tungsten oxide films

THIN SOLID FILMS

卷:519

Article

Green, S. V.¹  Kuzmin, A.²  Purans, J.²  Granqvist, C. G.¹  Niklasson, G. A.¹ 

[1] Uppsala Univ, Dept Engn Sci, Angstrom Lab, SE-75121 Uppsala, Sweden

[2] Univ Latvia, Inst Solid State Phys, Riga, Latvia

关键词: Tungsten oxide;    Nickel oxide;    X-ray photoelectron spectroscopy;    Rutherford backscattering;    X-ray diffraction;    Raman spectroscopy;   

DOI  :  10.1016/j.tsf.2010.10.033

来源: Elsevier

【 摘 要 】

Films of mixed nickel-tungsten oxide, denoted Ni(x)W(1-x) oxide, were prepared by reactive DC magnetron co-sputtering from metallic targets and were characterized by Rutherford backscattering spectrometry. X-ray photoelectron spectroscopy, X-ray diffractometry and Raman spectroscopy. A consistent picture of the structure and composition emerged, and at x<0.50 the films comprised a mixture of amorphous WO(3) and nanosized NiWO(4), at x = 0.50 the nanosized NiWO(4) phase was dominating, and at x>0.50 the films contained nanosized NiO and NiWO(4). (C) 2010 Elsevier B.V. All rights reserved.

【 授权许可】

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