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Deposition of zirconium oxide using atmospheric pressure plasma enhanced chemical vapor deposition with various precursors
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Patel, Dhruval1  Bonova, Lucia1,2  Jeckell, Zachary1  Barlaz, D. Eitan1  Chaudhuri, Santanu3  Krogstad, Daniel, V4  Ruzic, David N.1 
[1] Univ Illinois, Nucl Plasma Radiol Engn, 104 South Wright St, Urbana, IL 61801 USA
[2] Slovak Univ Technol Bratislava, Adv Technol Res Inst, Jana Bottu 25, Trnava 91724, Slovakia
[3] Univ Illinois, Civil Mat & Environm Engn, Engn Res Facil 2095, 842 W Taylor St, Chicago, IL 60607 USA
[4] Appl Res Inst, 2100 S Oak St, Champaign, IL 61820 USA
关键词: Atmospheric pressure plasma;    Zirconia;    Liquid assisted plasma enhanced chemical vapor deposition;    Zirconium oxynitrate hydrate;    Zirconium tert-butoxide;    Zirconium acetylacetonate;   
DOI  :  10.1016/j.tsf.2021.138815
来源: Elsevier
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