期刊论文详细信息
| THIN SOLID FILMS | 卷:733 |
| Deposition of zirconium oxide using atmospheric pressure plasma enhanced chemical vapor deposition with various precursors | |
| Article | |
| Patel, Dhruval1  Bonova, Lucia1,2  Jeckell, Zachary1  Barlaz, D. Eitan1  Chaudhuri, Santanu3  Krogstad, Daniel, V4  Ruzic, David N.1  | |
| [1] Univ Illinois, Nucl Plasma Radiol Engn, 104 South Wright St, Urbana, IL 61801 USA | |
| [2] Slovak Univ Technol Bratislava, Adv Technol Res Inst, Jana Bottu 25, Trnava 91724, Slovakia | |
| [3] Univ Illinois, Civil Mat & Environm Engn, Engn Res Facil 2095, 842 W Taylor St, Chicago, IL 60607 USA | |
| [4] Appl Res Inst, 2100 S Oak St, Champaign, IL 61820 USA | |
| 关键词: Atmospheric pressure plasma; Zirconia; Liquid assisted plasma enhanced chemical vapor deposition; Zirconium oxynitrate hydrate; Zirconium tert-butoxide; Zirconium acetylacetonate; | |
| DOI : 10.1016/j.tsf.2021.138815 | |
| 来源: Elsevier | |
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