Neutron reflectometry investigations of interfacial structures of Ti/TiN layers deposited by magnetron sputtering

THIN SOLID FILMS

卷:616

Article

Watkins, E. B.¹  Majewski, J.^2,3  Baldwin, J. K.²  Chen, Y.²  Li, N.²  Hoagland, R. G.⁴  Yadav, S. K.⁴  Liu, X. -Y.⁴  Beyerlein, I. J.⁵  Mara, N. A.^2,6 

[1] Los Alamos Natl Lab, Mat Phys & Applicat Div, MPA 11, Los Alamos, NM 87545 USA

[2] Los Alamos Natl Lab, Ctr Integrated Nanotechnol, Mat Phys & Applicat Div, Los Alamos, NM 87545 USA

[3] Univ Calif Davis, Dept Chem Engn, Davis, CA 95616 USA

[4] Los Alamos Natl Lab, Mat Sci & Technol Div, MST 8, Los Alamos, NM 87545 USA

[5] Los Alamos Natl Lab, Div Theoret, Fluid Dynam & Solid Mech, T-3, Los Alamos, NM 87545 USA

[6] Los Alamos Natl Lab, Inst Mat Sci, Los Alamos, NM 87545 USA

关键词: Titanium;    Titanium nitride;    Engineered interfaces;    Composite materials;    Neutron reflectivity;   

DOI  :  10.1016/j.tsf.2016.08.064

来源: Elsevier

【 摘 要 】

Nanolayered metal-ceramic composite systems provide the possibility to produce new materials with exceptional strength, toughness, and radiation resistance not exhibited by their individual constituents. The unusual behaviors are frequently attributed to the high density of internal interfaces. Most layered structures studied to date contain sharp interfaces and the synthesis of more diffuse interfacial structures, where the interface is graded out of the interface plane, has not been deeply explored. Here we show how neutron reflectometry was used to study the structure of magnetron sputter deposited titanium and titanium nitride (Ti/fiN) layers as a function of deposition parameters: temperature, rate of N-2 flow or pressure, electrical bias applied to the sample, and orientation of the ion source relative to the sample. These different deposition and post-processing strategies resulted in profound changes in the structure of the interfacial region between the two components in Ti/TiNx bilayers. The results show that temperature and low step-wise N-2 flow rates, but not electrical bias, can form graded interfaces in a controlled manner. (C) 2016 Elsevier B.V. All rights reserved.

【 授权许可】

Free