Carbide formation in tungsten-containing amorphous carbon films by annealing

THIN SOLID FILMS

卷:519

Article; Proceedings Paper

Balden, M.¹  Sauter, P. A.¹  Jong, S.¹  Adelhelm, C.¹  Lindig, S.¹  Rasinski, M.^1,2  Plocinski, T.² 

[1] EURATOM, Max Planck Inst Plasmaphys, D-85748 Garching, Germany

[2] Warsaw Univ Technol, Fac Mat Sci & Engn, PL-02507 Woloska, Poland

关键词: Plasma-materials interaction;    Carbon-based amorphous films;    Chemical reactions;   

DOI  :  10.1016/j.tsf.2011.01.403

来源: Elsevier

【 摘 要 】

Tungsten-containing amorphous carbon films were produced by dual magnetron sputter deposition. The formation of carbide phases after heat treatment in inert gas at temperatures up to 2800 K was investigated by X-ray diffraction for tungsten concentrations below 25 at.%. After deposition, each film consists of an amorphous carbon matrix with atomically dispersed W inclusions. Annealing up to 2800 K leads to a formation of carbide phases and to nano clustering. Three tungsten carbide phases were observed (WC, W2C, and WC1-x), mostly as mixtures of two phases. The phase combination depends on annealing temperature and W concentration. Additionally, nano diffraction was performed in a scanning transmission electron microscope, to determine the phase of single crystallites at scales, where X-ray diffraction fails. (C) 2011 Elsevier B.V. All rights reserved.

【 授权许可】

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