| THIN SOLID FILMS | 卷:501 |
| Progress in single junction microcrystalline silicon solar cells deposited by Hot-Wire CVD | |
| Article; Proceedings Paper | |
| Fonrodona, M ; Soler, D ; Villar, F ; Escarré, J ; Asensi, JM ; Bertomeu, J ; Andreu, J | |
| 关键词: microcrystalline silicon; hot-wire CVD; solar cells; | |
| DOI : 10.1016/j.tsf.2005.07.146 | |
| 来源: Elsevier | |
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【 摘 要 】
Hot-Wire Chemical Vapor Deposition has led to microcrystalline silicon solar cell efficiencies similar to those obtained with Plasma Enhanced CVD. The light-induced degradation behavior of microcrystalline silicon solar cells critically depends on the properties of their active layer. In the regime close to the transition to amorphous growth (around 60% of amorphous volume fraction), cells incorporating an intrinsic layer with slightly higher crystalline fraction and [220] preferential orientation are stable after more than 7000 h of AM1.5 light soaking. On the contrary, solar cells whose intrinsic layer has a slightly lower crystalline fraction and random or [111] preferential orientation exhibit clear light-induced degradation effects. A revision of the efficiencies of Hot-Wire deposited microcrystalline silicon solar cells is presented and the potential efficiency of this technology is also evaluated. (c) 2005 Elsevier B.V. All rights reserved.
【 授权许可】
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【 预 览 】
| Files | Size | Format | View |
|---|---|---|---|
| 10_1016_j_tsf_2005_07_146.pdf | 145KB |
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