The crystallization and properties of sputter deposited lithium niobite

THIN SOLID FILMS

卷:609

Article

Shank, Joshua C.¹  Tellekamp, M. Brooks¹  Doolittle, W. Alan¹ 

[1] Georgia Inst Technol, Dept Elect & Comp Engn, Atlanta, GA 30332 USA

关键词: Lithium niobite;    Sputter deposition;    X-ray diffraction;    X-ray photoelectron spectroscopy;   

DOI  :  10.1016/j.tsf.2016.01.030

来源: Elsevier

【 摘 要 】

Sputter deposition of the thin film memristor material, lithium niobite (LiNbO2) is performed by co-deposition from a lithium oxide (Li2O) and a niobium target. Crystalline films that are textured about the (101) orientation are produced under room temperature conditions. This material displays memristive hysteresis and exhibits XPS spectra similar to MBE and bulk grown LiNbO2. Various deposition parameters were investigated resulting in variations in the deposition rate, film crystallinity, oxygen to niobium ratio, and mean niobium oxidation state. The results of this study allow for the routine production of large area LiNbO2 films at low substrate temperature useful in hybrid-integration of memristor, optical, and energy storage applications. (C) 2016 Elsevier B.V. All rights reserved.

【 授权许可】

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