期刊论文详细信息
SURFACE & COATINGS TECHNOLOGY 卷:250
Comparison of HIPIMS sputtered Ag- and Cu-surfaces leading to accelerated bacterial inactivation in the dark
Article
Rtimi, Sami1  Baghriche, Oualid1  Pulgarin, Cesar1  Ehiasarian, Arutiun2  Bandorf, Ralf3  Kiwi, John4 
[1] Ecole Polytech Fed Lausanne, SB ISIC GPAO, CH-1015 Lausanne, Switzerland
[2] Sheffield Hallam Univ, Sheffield S1 1WB, S Yorkshire, England
[3] Fraunhofer Inst Surface Engn & Thin Films IST, D-38108 Braunschweig, Germany
[4] Ecole Polytech Fed Lausanne, SB ISIC LPI, CH-1015 Lausanne, Switzerland
关键词: HIPIMS sputtering;    Bacterial inactivation;    Dark;   
DOI  :  10.1016/j.surfcoat.2014.02.029
来源: Elsevier
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【 摘 要 】

Recently, compact uniform and adhesive films of Ag and Cu have been prepared by DC-magnetron sputtering (DC), pulsed DC magnetron sputtering (DCP) and high power impulse magnetron sputtering (HIPIMS). This study reports the HIPIMS deposition for Ag and Cu on textile fabrics, the bacterial inactivation kinetics and the nature of the species in the plasma produced during HIPIMS sputtering. The deposition rates of Ag and Cu atoms and the bacterial inactivation times are reported in the dark and under light as a function of the applied peak currents during the sputtering by HIPIMS. By X-ray photoelectron spectroscopy (XPS), the surface percentage atomic concentration and the oxidation state changes are reported during bacterial inactivation. The Ar and metal-ions produced in the magnetron chamber were determined by mass spectroscopy (QMS). A mechanism for the bacterial inactivation is suggested for Ag and Cu HIPIMS sputtered surfaces. (C) 2014 Elsevier B.V. All rights reserved.

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