Preparation of highly (100)-oriented CeO2 films on polycrystalline Al2O3 substrates by laser chemical vapor deposition

SURFACE & COATINGS TECHNOLOGY

卷:204

Article

Zhao, Pei¹  Ito, Akihiko¹  Tu, Rong¹  Goto, Takashi¹ 

[1] Tohoku Univ, Inst Mat Res, Aoba Ku, Sendai, Miyagi 9808577, Japan

关键词: Laser chemical vapor deposition;    CeO2 film;    High deposition rate;   

DOI  :  10.1016/j.surfcoat.2010.04.037

来源: Elsevier

【 摘 要 】

CeO2 films were prepared on Al2O3 substrates by laser chemical vapor deposition at different laser power (P-L) up to 182 W. The (100)-oriented CeO2 films were prepared at P-L=101-167 W (T-dep = 792-945 K). The texture coefficient (TC) of (200) reflection had a maximum of 6.7 at P-L=113 W (T-dep = 836 K). The (100)-oriented CeO2 films consisted of granular grains and showed a columnar cross section. The deposition rates (R-dep) of (100)-oriented CeO2 films showed a maximum of 43 mu m h(-1) at P-L=152 W (T-dep=912 K). (C) 2010 Elsevier B.V. All rights reserved.

【 授权许可】

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