On the description of metal ion return in reactive high power impulse magnetron sputtering

SURFACE & COATINGS TECHNOLOGY

卷:418

Article

Kubart, T.¹  Fernandes, D. F.¹  Nyberg, T.¹ 

[1] Uppsala Univ, Dept Elect Engn, Solid State Elect, S-75103 Uppsala, Sweden

关键词: Reactive sputtering;    Reactive HiPIMS;    Thin films;    Process modelling;    Metal back-attraction;   

DOI  :  10.1016/j.surfcoat.2021.127234

来源: Elsevier

【 摘 要 】

Back-attraction of ionized metal is an important process in reactive high power impulse magnetron sputtering (R-HiPIMS). Here, we discuss the implementation of the metal return in balance type models for reactive magnetron sputtering. We show that the existing description of surface processes needs to be modified to satisfy mass conservation. A new steady-state time-averaged model is presented and used to evaluate the effect of the metal return in R-HiPIMS. The results show that the metal return leads to an increased oxide fraction in the deposited coating in R-HiPIMS. This effect can explain the high rate deposition of stoichiometric compounds deposited in the metal mode of operation that has been observed experimentally.

【 授权许可】

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