Oxidation and diffusion processes during annealing of TiSi(V)N films

SURFACE & COATINGS TECHNOLOGY

卷:275

Article

Fernandes, F.¹  Morgiel, J.²  Polcar, T.^3,4  Cavaleiro, A.¹ 

[1] Univ Coimbra, SEG CEMUC, Dept Mech Engn, P-3030788 Coimbra, Portugal

[2] Polish Acad Sci, Inst Met & Mat Sci, Krakow, Poland

[3] Univ Southampton, Natl Ctr Adv Tribol nCATS, Sch Engn Sci, Southampton SO17 1BJ, Hants, England

[4] Czech Tech Univ, Dept Control Engn, Tech 2, Prague 16627 6, Czech Republic

关键词: TiSiVN system;    Structural evolution;    Oxidation;    Oxide scale;    Diffusion processes;   

DOI  :  10.1016/j.surfcoat.2015.05.031

来源: Elsevier

【 摘 要 】

The degradation of self-lubricant hard coatings applied in tools for high-speed cutting or dry drilling operations occurs by a combination of wear, oxidation and diffusion. The aim of this investigation was to study the effect of V additions on the diffusion processes and on the oxide scale formation during annealing of TiSiVN coatings. Relation of these results with those achieved for a reference Ti0.80Si0.15N coating with similar Si content is also presented. The structure evolution of the Ti0.65Si0.11V0.15N film was assessed by an in-situ hot-XRD device. A dual layer oxide was formed in the case of Ti0.80Si0.15N coating with a protective Si-O layer at an oxide/coating interface; however, in zones of film defects a complex oxide structure was developed. V additions increased the oxidation rate of the coatings as a result of the V ions diffusion throughout the oxide scale, which inhibited the formation of a continuous protective silicon oxide layer. (C) 2015 Elsevier B.V. All rights reserved.

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