Interdependence of structural and electrical properties in tantalum/tantalum oxide multilayers

SURFACE & COATINGS TECHNOLOGY

卷:227

Article

Cacucci, Arnaud¹  Loffredo, Stephane¹  Potin, Valerie¹  Imhoff, Luc¹  Martin, Nicolas² 

[1] Univ Bourgogne, UMR CNRS 6303, Lab Interdisciplinaire Carnot Bourgogne, F-21078 Dijon, France

[2] Univ Franche Comte, ENSMM, Inst FEMTO ST, UMR CNRS 6174,UTBM, F-25044 Besancon, France

关键词: Tantalum oxide;    Thin film;    Reactive sputtering;    Gas pulsing;    Electrical properties;   

DOI  :  10.1016/j.surfcoat.2012.10.064

来源: Elsevier

【 摘 要 】

Dc reactive sputtering was used to deposit tantalum metal/oxide periodic nanometric multilayers using the artful technique namely, the reactive gas pulsing process (RGPP). Different pulsing periods were used for each deposition to produce metal-oxide periodic alternations included between 5 and 80 nm. Structure, crystallinity and chemical composition of these films were systematically investigated by Transmission Electron Microscopy (TEM) and Energy-dispersive X-ray (EDX) spectroscopy techniques. Moreover, electrical properties were also studied by the van der Pauw technique. (C) 2012 Elsevier B.V. All rights reserved.

【 授权许可】

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