Low-loss amorphous silicon-on-insulator technology for photonic integrated circuitry

OPTICS COMMUNICATIONS

卷:282

Article

Selvaraja, Shankar Kumar¹  Sleeckx, Erik²  Schaekers, Marc²  Bogaerts, Wim¹  Van Thourhout, Dries¹  Dumon, Pieter¹  Baets, Roel¹ 

[1] Univ Ghent, IMEC, Dept Informat Technol, B-9000 Ghent, Belgium

[2] IMEC, B-3001 Louvain, Belgium

关键词: Integrated optics;    Waveguides;    Amorphous silicon;   

DOI  :  10.1016/j.optcom.2009.01.021

来源: Elsevier

【 摘 要 】

We report the fabrication of low-loss amorphous silicon photonic wires deposited by plasma enhanced chemical vapor deposition. Single mode photonic wires were fabricated by 193 nm optical lithography and dry etching. Propagation loss measurements show a loss of 3.46 dB/cm for photonic wires (480 x 220 nm) and 1.34 dB/cm for ridge waveguides. (C) 2009 Elsevier B.V. All rights reserved.

【 授权许可】

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