Improved block copolymer domain dispersity on chemical patterns via homopolymer-blending and molecular transfer printing

POLYMER

卷:116

Article

Liu, Guoliang^1,2  Nealey, Paul F.^3,4 

[1] Virginia Tech, Dept Chem, 800 West Campus Dr, Blacksburg, VA 24061 USA

[2] Virginia Tech, MII, 800 West Campus Dr, Blacksburg, VA 24061 USA

[3] Univ Chicago, Inst Mol Engn, 5801 South Ellis Ave, Chicago, IL 60637 USA

[4] Argonne Natl Lab, Mat Sci Div, 9700 S Cass Ave, Argonne, IL 60439 USA

关键词: Block copolymer;    Directed assembly;    Chemical pattern;   

DOI  :  10.1016/j.polymer.2017.03.049

来源: Elsevier

【 摘 要 】

Herein we have investigated the domain width distributions of block copolymers and their ternary blends after directed assembly on chemically patterned surfaces with and without density multiplication. On chemical patterns with density multiplication, the width of the interpolated block copolymer domains was bimodal. Once blended with the corresponding homopolymers, the block copolymers exhibited unimodal distributions of domain width due to the redistribution of homopolymers in the block copolymer domains. When the block copolymers were blended with hydroxyl-terminated homopolymers, the homopolymers with functional end-groups healed the chemical patterns and facilitated the formation of nanostructures with further improved domain width distributions. Lastly, it is demonstrated that the block copolymers achieved the most improved domain width distributions when directed to assemble without density multiplication on one-to-one chemical patterns generated by molecular transfer printing. (C) 2017 Elsevier Ltd. All rights reserved.

【 授权许可】

Free