Raman scattering and x-ray diffraction studies of polycrystalline CaCu3Ti4O12 under high-pressure

Article

关键词: HIGH-DIELECTRIC-CONSTANT;    PULSED-LASER DEPOSITION;    THIN-FILMS;    OPTICAL-PROPERTIES;    001 LAALO3;    OXIDE;   

DOI  :  10.1103/PhysRevB.70.132103

来源: SCIE

【 摘 要 】

We report Raman scattering and x-ray diffraction studies of polycrystalline CaCu3Ti4O12 (CCTO) under high pressures. The pressure dependence of several Raman modes was investigated. No anomalies have been observed on the phonon spectra thereby indicating that the T-h (Im (3) over bar) structure remains stable up to the maximum pressure (5.3 GPa) we reached in this experiment. The pressure coefficients for the observed Raman modes were determined. This set of parameters was used for evaluating the stress developed in CCTO thin films. The high-pressure x-ray studies were extended up to 46 GPa and the data confirmed that the T-h structure remains stable up to this pressure. The pressure-volume data are well described by the Birch's equation of state. The experimental value of the zero pressure bulk modulus is B-0=212+/-2 GPa. Gruneisen parameters of CCTO were also determined.

【 授权许可】

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