Surface/interface-roughness-induced demagnetizing effect in thin magnetic films

Article

关键词: MOLECULAR-BEAM EPITAXY;    INTERFACE ROUGHNESS;    GIANT MAGNETORESISTANCE;    SURFACE-ROUGHNESS;    CO FILMS;    GROWTH;    MULTILAYERS;    HYSTERESIS;    DIFFRACTION;   

DOI  :  10.1103/PhysRevB.60.1216

来源: SCIE

【 摘 要 】

We study the influence of surface/interface roughness on the demagnetizing factor of a thin magnetic film with a single or a double boundary of self-affine, mound or anisotropic roughness. For a film with a single self-affine rough boundary, the in-plane demagnetizing factor N-xx(yy) is proportional to the interface width w square and to the leading order is inversely proportional to the lateral correlation length xi. The roughness exponent alpha is also shown to greatly affect N-xx(yy). For a film with a single mound boundary, N-xx(yy) is inversely proportional to the apparent correlation length, and also depends on the ratio of the two different lateral lengths: the average mound separation lambda and the randomness correlation length zeta. It is also shown that an anisotropic surface morphology can induce anisotropic in-plane demagnetizing factors. The demagnetizing anisotropy can be magnified by a morphological anisotropy. Furthermore, we consider films with two rough boundaries. Besides a general formalism derived for the demagnetizing factor, we investigate how the cross correlation of the two rough boundaries affects the in-plane demagnetizing factors. Connections between the demagnetizing factor and thin-film growth mechanisms are also discussed.

【 授权许可】

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