Atomic Layer Deposition of Lithium–Nickel–Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries

Energies

Aleksander Rumyantsev¹  Maxim Maximov²  Oleg Medvedev²  Yury Koshtyal²  Anatoly Popovich²  Ilya Mitrofanov²  Artem Kim²  Ilya Ezhov²  Denis Nazarov³ 

[1] Ioffe Institute, 194021 Saint Petersburg, Russia;Peter the Great Saint-Petersburg Polytechnic University, 195221 Saint Petersburg, Russia;Saint Petersburg State University, 199034 Saint Petersburg, Russia;

关键词: atomic layer deposition;    lithium–nickel–silicon oxide;    Li-ion batteries;    thin-film battery;    cathode materials;   

DOI  :  10.3390/en13092345

来源: DOAJ

【 摘 要 】

Lithium nickelate (LiNiO₂) and materials based on it are attractive positive electrode materials for lithium-ion batteries, owing to their large capacity. In this paper, the results of atomic layer deposition (ALD) of lithium–nickel–silicon oxide thin films using lithium hexamethyldisilazide (LiHMDS) and bis(cyclopentadienyl) nickel (II) (NiCp₂) as precursors and remote oxygen plasma as a counter-reagent are reported. Two approaches were studied: ALD using supercycles and ALD of the multilayered structure of lithium oxide, lithium nickel oxide, and nickel oxides followed by annealing. The prepared films were studied by scanning electron microscopy, spectral ellipsometry, X-ray diffraction, X-ray reflectivity, X-ray photoelectron spectroscopy, time-of-flight secondary ion mass spectrometry, energy-dispersive X-ray spectroscopy, transmission electron microscopy, and selected-area electron diffraction. The pulse ratio of LiHMDS/Ni(Cp)₂ precursors in one supercycle ranged from 1/1 to 1/10. Silicon was observed in the deposited films, and after annealing, crystalline Li₂SiO₃ and Li₂Si₂O₅ were formed at 800 °C. Annealing of the multilayered sample caused the partial formation of LiNiO₂. The obtained cathode materials possessed electrochemical activity comparable with the results for other thin-film cathodes.

【 授权许可】

Unknown