Low-loss slot waveguides with silicon (111) surfaces realized using anisotropic wet etching

Frontiers in Materials

Hideo Arimoto¹  Swe Zin Oo¹  Ali Z Khokhar¹  Graham Trevor Reed¹  Shinichi Saito¹  Kapil Debnath¹  Stuart A Boden¹  Harold M H Chong¹ 

[1] University of Southampton;

关键词: silicon photonics;    integrated photonics;    Waveguide;    Slot waveguide;    Anisotropic wet etching;   

DOI  :  10.3389/fmats.2016.00051

来源: DOAJ

【 摘 要 】

We demonstrate low-loss slot waveguides on silicon-on-insulator (SOI) platform. Waveguides oriented along the (11-2) direction on the Si (110) plane were first fabricated by a standard e-beam lithography and dry etching process. A TMAH based anisotropic wet etching technique was then used to remove any residual side wall roughness. Using this fabrication technique propagation loss as low as 3.7dB/cm was realized in silicon slot waveguide for wavelengths near 1550nm. We also realized low propagation loss of 1dB/cm for silicon strip waveguides.

【 授权许可】

Unknown