| Heliyon | |
| Simultaneous removal of five triazole fungicides from synthetic solutions on activated carbons and cyclodextrin-based adsorbents | |
| Nadia Morin-Crini1  Adeline Exposito Saintemarie1  Laurence Millon1  Grégorio Crini1  Audrey Jeanvoine1  Steffi Rocchi1  Marc Fourmentin2  | |
| [1] Université de Bourgogne Franche-Comté, UFR Sciences et Techniques, Laboratoire Chrono-environnement, UMR 6249, 16 Route de Gray, 25030 Besançon cedex, France;Université du Littoral Côte d’Opale, Laboratoire de Physico-Chimie de l’Atmosphère MREI2, 189A Avenue Maurice Schumann, 59140 Dunkerque, France; | |
| 关键词: Materials Science; Materials Chemistry; | |
| DOI : 10.1016/j.heliyon.2017.e00380 | |
| 来源: DOAJ | |
【 摘 要 】
In this study, an adsorption-oriented process for the removal of fungicides from polycontaminated aqueous solutions was applied. To remove triazole fungicides from aqueous mixtures of propiconazole (PROPI), tebuconazole (TEBU), epoxiconazole (EPOXI), bromuconazole (BROMU) and difenoconazole (DIFENO), several materials used as adsorbents were compared using batch experiments, namely two conventional activated carbons (ACs) and five nonconventional cross-linked cyclodextrin (CD)-based materials (α-CDP, β-CDP, γ-CDP, αβγ-CDP mixture, and hydroxypropyl-β-CDP). This article presents the abatements obtained. As expected, ACs exhibited the highest levels of triazole fungicide removal: the treatment lowered the five azoles by more than 99%, and adsorption was non-selective. Concerning CD-based materials employed for the first time for the removal of fungicides from polycontaminated aqueous solutions, results were interesting in particular for hydroxypropyl-β-CDP: 1 g of adsorbent placed in 1 L of solution containing 1 mg of each of five triazoles (5 mg in total) was able to remove over half of the fungicide amount (2.97 mg). The order obtained was the following: BROMU << PROPI ≅ EPOXI < TEBU << DIFENO. This indicates that, in the mixture studied, strong competition prevailed among fungicides for the binding sites.
【 授权许可】
Unknown