Towards Non-Degenerate Quantum Lithography

Applied Sciences

Yanhua Shih¹  Hui Chen²  Jianbin Liu³  Tao Peng⁴  Yu Zhou⁵ 

[1] International Center for Dielectric Research, School of Electronic and Information Engineering, Xi’an Jiaotong University, Xi’an 710049, China;M University, College Station, TX 77843, USA;;Electronic Materials Research Laboratory, Key Laboratory of the Ministry of Education &;Institute for Quantum Science and Engineering, Texas A &MOE Key Laboratory for Nonequilibrium Synthesis and Modulation of Condensed Matter, Department of Applied Physics, Xi’an Jiaotong University, Xi’an 710049, China;

关键词: quantum lithography;    entangled photon pairs;    quantum imaging;   

DOI  :  10.3390/app8081292

来源: DOAJ

【 摘 要 】

The photonic de Broglie wavelength of a non-degenerate entangled photon pair is measured by using a Young’s double slit interferometer, which proves that the non-degenerate entangled photon pairs have the potential to be used in quantum lithography. Experimental results show that the de Broglie wavelength of non-degenerate biphotons is well defined and its wavelength is neither the wavelength of the signal photon, nor the wavelength of the idler photon. According to the de Broglie equation, its wavelength corresponds to the momentum of the biphoton, which equals the sum of the momenta of signal and idler photons. The non-degenerate ghost interference/diffraction is also observed in these experiments.

【 授权许可】

Unknown