Influence of the Curing and Annealing Temperatures on the Properties of Solution Processed Tin Oxide Thin Films

Crystals

Christophe Avis¹  Jin Jang¹ 

[1] Advanced Display Research Center, Department of Information Display, Kyung Hee University, Seoul 02447, Korea;

关键词: tin oxide;    solution process;    amorphous phase;    crystallinity;    size grain;    optical properties;   

DOI  :  10.3390/cryst11080851

来源: DOAJ

【 摘 要 】

We report the effect of the curing (T_curing) and annealing (T_anneal) temperatures on the structural, electrical, and optical properties of solution processed tin oxide. T_anneal was varied from 300 to 500 °C, and T_curing from 200 °C to T_anneal. All T_anneal lead to a polycrystalline phase, but the amorphous phase was observed at T_anneal = 300 °C and T_curing ranging from 250 to 300 °C. This could be explained by the melting point of the precursor (SnCl₂), occurring at 250 °C. The crystallinity can be effectively controlled by the annealing temperature, but the curing temperature dramatically affects the grain size. We can reach grain sizes from 5–10 nm (T_curing = 200 °C and T_anneal = 300 °C) to 30–50 nm (T_curing = 500 °C and T_anneal = 500 °C). At a fixed T_anneal, Hall mobilities, carrier concentration, and conductivity increased with the curing temperature. The Hall mobility was in the range of 1 to 9.4 cm²/Vs, the carrier concentration was 10¹⁸ to 10¹⁹ cm⁻³, and the conductivity could reach ~20 S/cm when the grain size was 30–50 nm. The optical transmittance, the optical bandgap, the refractive index, and the extinction coefficient were also analyzed and they show a correlation with the annealing process.

【 授权许可】

Unknown