Pt–Ti Alloy Coatings Deposited by DC Magnetron Sputtering: A Potential Current Collector at High Temperature

Coatings

Nicolas Martin¹  Alain Billard²  Pascal Briois²  Mohammad Arab-Pour-Yazdi² 

[1] FEMTO-ST Institute (UMR CNRS 6174), Univ. Bourgogne Franche-Comté, 15 Avenue des Montboucons, F-25030 Besançon Cedex, France;FEMTO-ST Institute (UMR CNRS 6174), Univ. Bourgogne Franche-Comté, UTBM, 2 Place Lucien Tharradin, F-25200 Montbéliard Cedex, France;

关键词: resistivity;    magnetron sputtering;    coating;    pt–ti alloys;   

DOI  :  10.3390/coatings10030224

来源: DOAJ

【 摘 要 】

Metallic platinum−titanium coatings were deposited by co-sputtering of two metallic Pt and Ti targets in pure argon atmosphere. The titanium concentrations varied from 0 to 47 atomic percent and were adjusted as a function of the current applied to the titanium target. The structural and chemical features of these films were assessed by X-ray diffraction (XRD) and scanning electron microscopy (SEM). All as-deposited coatings exhibit a perfect covering of the alumina pellets’ substrate surface. The coatings containing more than 4 at.% Ti are amorphous, whereas the others crystallize in the face-centered cubic (fcc) structure of platinum. After an annealing treatment under air for 2 h, all of the coatings adopt the fcc structure with a crystallization temperature depending on the titanium content. For titanium concentrations higher than 32 at.%, the TiO₂ phase appears during the annealing treatment. For the smaller film thickness of Pt−Ti alloys (15 nm), the Ostwald ripening mechanism is observed by SEM increasing the annealing temperature regardless of the content of Ti. The film resistivity measured at room temperature is lower than 7 10⁻⁴ Ω·cm and increases with the temperature to achieve an insulating behavior (in air and reducing atmosphere Ar-H₂ (90-10) at 1123 K the resistivity is ρ 10⁺³⁶ Ω·cm). When the thickness of intermetallic Pt₃Ti layer is higher than 50 nm, the coating is continuous and the resistivity is below 5 10⁻⁴ Ω·cm in air and in reducing atmosphere (Ar with 10% of H₂) up to 1273 K.

【 授权许可】

Unknown