Research of Constructive and Technological Methods for Forming a Silicon Disk Resonator with Whispering Gallery Modes

Photonics

Vladimir Amelichev¹  Alexey Kadochkin¹  Sergey Generalov¹  Anastasia Yakuhina¹  Dmitry Gorelov¹ 

[1] Scientific-Manufacturing Complex Technological Centre, Zelenograd, 124498 Moscow, Russia;

关键词: whispering gallery mode;    microresonator;    silicon disk resonator;    wedge-shaped profile;    silicon-on-isolator;    plasma chemical etching;   

DOI  :  10.3390/photonics7020031

来源: DOAJ

【 摘 要 】

This article presents the results of a computer simulation of whispering gallery modes in the structure of a silicon disk resonator with a wedge-shaped profile made on a silicon-on-isolator base (SOI). The rationale for the choice of silicon as a material for its manufacturing is given. The results of the study of the influence of the wedge angle on the whispering gallery mode parameters (WGM) are presented. The optimum wedge angle of a silicon disk resonator is determined, which ensures the minimum loss and maximum mode stability. The technological aspects of plasma-chemical etching processes for forming a wedge-shaped profile of the edge of a silicon disk resonator are studied.

【 授权许可】

Unknown