RF and Microwave Ion Sources Study at Institute of Modern Physics

Plasma

Qi Wu¹  Qian Y. Jin¹  Yang Zhou¹  Yu G. Liu¹  Yao J. Zhai¹  Liang T. Sun¹ 

[1] Institute of Modern Physics, Chinese Academy of Sciences, Lanzhou 730000, China;

关键词: RF plasma;    RF coupling;    antenna;    negative ion;    intense ion beam;   

DOI  :  10.3390/plasma4020022

来源: DOAJ

【 摘 要 】

Intense ion beam production is of high importance for various versatile applications from accelerator injectors to secondary ion mass spectrometry (SIMS). For these purposes, different types of ion beams are needed and, accordingly, the optimum plasma to produce the desired ion beams. RF-type plasma features a simple structure, high plasma density and low plasma temperature, which is essential for negative ion beam production. A very compact RF-type ion source using a planar coil antenna has been developed at IMP for negative molecular oxygen ion beam production. In terms of high-intensity positive ion beam production, 2.45 GHz microwave power-excited plasma has been widely used. At IMP, we developed a 2.45 GHz plasma source with both ridged waveguide and coaxial antenna coupling schemes, tested successfully with intense beam production. Thanks to the plasma built with an external planar coil antenna, high ${\mathrm{O}}_2^{-}$ production efficiency has been achieved, i.e., up to 43%. With 2.45 GHz microwave plasma, the ridged waveguide can support a higher power coupling of high efficiency that leads to the production of intense hydrogen beams up to 90 emA, whereas the coaxial antenna is less efficient in power coupling to plasma but can lead to attractive ion source compactness, with a reasonable beam extraction of several emA.

【 授权许可】

Unknown