Fabrication of Nanoscale Oxide Textured Surfaces on Polymers

Polymers

Tamar Segal-Peretz¹  Neta Shomrat¹  Barun K. Barick¹  Zohar Katzman²  Uri Green² 

[1] Department of Chemical Engineering, Technion, Haifa 3200003, Israel;Shamir Optical Industry Ltd., Kibbutz Shamir, Upper Galilee 1213500, Israel;

关键词: block copolymer;    solvent vapor annealing;    sequential infiltration synthesis;    nanotexture;    surface passivation;   

DOI  :  10.3390/polym13132209

来源: DOAJ

【 摘 要 】

Nanoscale textured surfaces play an important role in creating antibacterial surfaces, broadband anti-reflective properties, and super-hydrophobicity in many technological systems. Creating nanoscale oxide textures on polymer substrates for applications such as ophthalmic lenses and flexible electronics imposes additional challenges over conventional nanofabrication processes since polymer substrates are typically temperature-sensitive and chemically reactive. In this study, we investigated and developed nanofabrication methodologies to create highly ordered oxide nanostructures on top of polymer substrates without any lithography process. We developed suitable block copolymer self-assembly, sequential infiltration synthesis (SIS), and reactive ion etching (RIE) for processes on polymer substrates. Importantly, to prevent damage to the temperature-sensitive polymer and polymer/oxide interface, we developed the process to be entirely performed at low temperatures, that is, below 80 °C, using a combination of UV crosslinking, solvent annealing, and modified SIS and RIE processes. In addition, we developed a substrate passivation process to overcome reactivity between the polymer substrate and the SIS precursors as well as a high precision RIE process to enable deep etching into the thermally insulated substrate. These methodologies widen the possibilities of nanofabrication on polymers.

【 授权许可】

Unknown