Dispersion Optimization of Silicon Nitride Waveguides for Efficient Four-Wave Mixing

Photonics

Guo-Wei Lu¹  Yixiao Hong²  Yaping Hong³  Jianxun Hong³ 

[1] Division of Computer Engineering, The University of Aizu, Fukushima 965-8580, Japan;School of Electrical and Electronic Engineering, Hubei University of Technology, Wuhan 430068, China;School of Information Engineering, Wuhan University of Technology, Wuhan 430070, China;

关键词: four-wave mixing;    dispersion;    phase matching;    silicon nitride waveguide;    conversion efficiency;   

DOI  :  10.3390/photonics8050161

来源: DOAJ

【 摘 要 】

Silicon nitride waveguides have emerged as an excellent platform for photonic applications, including nonlinear optical signal processing, owing to their relatively high Kerr nonlinearity, negligible two photon absorption, and wide transparent bandwidth. In this paper, we propose an effective approach using 3D finite element method to optimize the dispersion characteristics of silicon nitride waveguides for four-wave mixing (FWM) applications. Numerical studies show that a flat and low dispersion profile can be achieved in a silicon nitride waveguide with the optimized dimensions. Near-zero dispersion of 1.16 ps/km/nm and 0.97 ps/km/nm at a wavelength of 1550 nm are obtained for plasma-enhanced chemical vapor deposition (PECVD) and low-pressure chemical vapor deposition (LPCVD) silicon nitride waveguides, respectively. The fabricated micro-ring resonator with the optimized dimensions exhibits near-zero dispersion of −0.04 to −0.1 ps/m/nm over a wavelength range of 130 nm which agrees with the numerical simulation results. FWM results show that near-zero phase mismatch and high conversion efficiencies larger than −12 dB using a low pump power of 0.5 W in a 13-cm long silicon nitride waveguide are achieved.

【 授权许可】

Unknown