Photoresist Design for Elastomeric Light Tunable Photonic Devices

Materials

Sara Nocentini¹  Daniele Martella¹  Camilla Parmeggiani¹  Diederik S. Wiersma¹ 

[1] European Laboratory for Non-Linear Spectroscopy (LENS), University of Florence, via Nello Carrara 1, 50019 Sesto Fiorentino, Italy;

关键词: liquid crystalline elastomers;    direct laser writing;    azobenzene containing polymers;   

DOI  :  10.3390/ma9070525

来源: DOAJ

【 摘 要 】

An increasing interest in tunable photonic structures is growing within the photonic community. The usage of Liquid Crystalline Elastomer (LCE) structures in the micro-scale has been motivated by the potential to remotely control their properties. In order to design elastic photonic structures with a three-dimensional lithographic technique, an analysis of the different mixtures used in the micro-printing process is required. Previously reported LCE microstructures suffer damage and strong swelling as a limiting factor of resolution. In this article, we reported a detailed study on the writing process with four liquid crystalline photoresists, in which the percentage of crosslinker is gradually increased. The experiments reveal that exploiting the crosslinking degree is a possible means in which to obtain suspended lines with good resolution, quite good rigidity, and good elasticity, thereby preserving the possibility of deformation by light irradiation.

【 授权许可】

Unknown