Morphology of SiO2 films as a key factor in alignment of liquid crystals with negative dielectric anisotropy

Beilstein Journal of Nanotechnology

Eva Otón¹  Josè Manuel Otón¹  Antigone Marino²  Volodymyr Tkachenko²  Noureddine Bennis³ 

[1] CEMDATIC, E.T.S.I. Telecomunicación, Universidad Politécnica de Madrid, Avda. Complutense 30, 28040 Madrid, Spain,;CNR-ISASI and Physics Department, University of Naples Federico II, Via Cinthia Monte S. Angelo, 80126, Naples, Italy;Institute of Applied Physics, Military University of Technology, 00-908 Warsaw, Poland;

关键词: anisotropy;    ellipsometry;    liquid crystal alignment;    morphology;    thin film;   

DOI  :  10.3762/bjnano.7.167

来源: DOAJ

【 摘 要 】

Control of liquid crystal (LC) orientation using a proper SiO2 alignment layer is essential for the optimization of vertically aligned nematic (VAN) displays. With this aim, we studied the optical anisotropy of thin SiO2 films by generalized ellipsometry as a function of deposition angle. The columnar SiO2 structure orientation measured by a noninvasive ellipsometry technique is reported for the first time, and its morphology influence on the LC alignment is demonstrated for large deposition angles.

【 授权许可】

Unknown