The Effect of Strontium Doping on LaFeO3 Thin Films Deposited by the PLD Method

Catalysts

Wojciech Maziarz¹  Anna Cyza¹  Łukasz Cieniek¹  Tomasz Moskalewicz¹  Jan Kusiński¹  Kazimierz Kowalski¹  Agnieszka Kopia¹ 

[1] Faculty of Metals Engineering and Industrial Computer Science, AGH University of Science and Technology, av. Mickiewicza 30, 30-059 Cracow, Poland;

关键词: perovskites;    LaFeO₃;    pulsed laser;   

DOI  :  10.3390/catal10090954

来源: DOAJ

【 摘 要 】

The aim of the presented investigations was to deposit the thin films La_1−xSr_xFeO₃ (x = 0, 0.1, 0.2) on (100) Si substrate by using the Pulsed Laser Deposition (PLD) method. Structure was exanimated by using XRD, SEM, AFM, TEM and XPS methods. The catalytic properties were analyzed in 4 ppm acetone atmosphere. The doping of Sr thin films La_1−xSr_xFeO₃ (x = 0, 0.1, 0.2) resulted in a decrease in the size of the crystallites, the volume of the elemental cell and change in the grain morphology. In the LaFeO₃ and La_0.9Sr_0.1FeO₃, clusters around which small grains grow are visible in the structure, while in the layer La_0.8Sr_0.2FeO₃, the visible grains are elongated. The TEM analysis has shown that the obtained thin films had a thickness in the range 150–170 nm with triangular or flat column ends. The experiment performed in the presence of gases allowed us to conclude that the surfaces (101/020) in the triangle-shaped columns and the plane (121/200) faces in flat columns were exposed to gases. The best properties in the presence of CH₃COCH₃ gas were noted for LaFeO₃ thin film with triangle columns ending with orientation (101/020).

【 授权许可】

Unknown