The Investigation of Microstructure, Photocatalysis and Corrosion Resistance of C-Doped Ti–O Films Fabricated by Reactive Magnetron Sputtering Deposition with CO2 Gas

Coatings

Yutao Pei¹  Huatang Cao¹  Cong Zhang²  Jiaqi Liu²  Zhiyu Wu³  Feng Wen³ 

[1] Department of Advanced Production Engineering, Engineering and Technology Institute Groningen, Faculty of Science and Engineering, University of Groningen, Nijenborgh 4, 9747 AG Groningen, The Netherlands;School of Materials Science and Engineering, Hainan University, Haikou 570228, China;Special Glass Key Lab of Hainan Province, Hainan University, Haikou 570228, China;

关键词: photocatalysis;    electrochemical impedance spectroscopy;    reactive magnetron sputtering;    carbon dioxide;   

DOI  :  10.3390/coatings11080881

来源: DOAJ

【 摘 要 】

By employing carbon dioxide as one source of reaction gases, carbon-doped Ti–O films were fabricated via reactive magnetron sputtering deposition. The chemical bonding configurations and microstructure of the films were analyzed by Raman spectrum and SEM, respectively. The effect of pH on the photocatalytic activities of the films was determined via evaluation of the decolorization rate of methyl orange under alkali, acid and neutrality conditions using UV light irradiation. Electrochemical impedance spectroscopy and potentiodynamic polarization tests were employed to determine the anti-corrosion properties. Compared with the C-free Ti–O film, the C-doped Ti–O films exhibit superior corrosion resistance. Furthermore, the results of the photodegradation experiment suggest that the C-doped Ti–O films have excellent photocatalytic activities and, for methyl orange, those with higher carbon content exhibit hyper-photodegradative effect under the alkali condition.

【 授权许可】

Unknown