Enhancement of the Plant Grafting Technique with Dielectric Barrier Discharge Cold Atmospheric Plasma and Plasma-Treated Solution

Plants

Igor G. Smirnov¹  Alexey I. Kutyrev¹  Vladimir I. Lukanin²  Yury K. Danilejko²  Evgeny M. Konchekov²  Leonid V. Kolik²  Konstantin V. Artem’ev²  Sergey V. Gudkov²  Sergey V. Belov²  Maxim E. Astashev²  Tatiana I. Pavlik² 

[1] Federal Scientific Agroengineering Center VIM, 109428 Moscow, Russia;Prokhorov General Physics Institute of the Russian Academy of Sciences, 119991 Moscow, Russia;

关键词: pear;    plasma-activated water;    Pyrus communis L.;    reactive nitrogen species;    reactive oxygen species;   

DOI  :  10.3390/plants11101373

来源: DOAJ

【 摘 要 】

A garden plant grafting technique enhanced by cold plasma (CAP) and plasma-treated solutions (PTS) is described for the first time. It has been shown that CAP created by a dielectric barrier discharge (DBD) and PTS makes it possible to increase the growth of Pyrus communis L. by 35–44%, and the diameter of the root collar by 10–28%. In this case, the electrical resistivity of the graft decreased by 20–48%, which indicated the formation of a more developed vascular system at the rootstock–scion interface. The characteristics of DBD CAP and PTS are described in detail.

【 授权许可】

Unknown