Effect of Firing Temperature on the Composition and Micro Structural Parameters of Screen Printed SnO2 Thick Films Resistors

Sensors & Transducers

A. S. Garde¹  R. Y. Borse¹ 

[1] Thin and Thick film laboratory, Department of Physics and Department of Electronic Science, M S G College, Malegaon Camp, Malegaon, Dist- Nasik-423 105, (MS), India;

关键词: SnO2;    Thick films;    Texture coefficient;    Microstrain;    SEM;    XRD;   

DOI  :  

来源: DOAJ

【 摘 要 】

Tin Oxide (SnO2) thick films were prepared on alumina substrate by using standard screen printing technique. Films were fired at different temperatures between 580 oC to 780 oC for 30 minutes in air atmosphere. The Morphological, Compositional and Structural properties of the SnO2 thick films were performed by X-ray diffraction (XRD) technique, Scanning electron microscopy (SEM), Energy dispersive spectroscopy (EDX), Fourier transformation Infrared spectroscopy (FTIR) and Ultra visible spectroscopy. Structural characterization indicated the formation of polycrystalline SnO2 films with tetragonal structure with preferred orientation along [211] plane. The X-ray line profile analysis has been used to evaluate the structural parameters such as crystallite size, texture coefficient, microstrain, and stacking fault probability. The effects of firing temperature on the structural parameters were analyzed. The crystallite size changes from 21 nm to 31 nm with increase firing temperature. Composition of Sn and O changes with firing temperature indicating non-stotiometric behavior of SnO2 films. IR spectroscopy analysis at 2949.26 cm-1 showed the peak assigned to the –Sn-H vibration due to the effect of hybridization i.e. sp3 and the sharp peak at 3734.31 cm-1 assigned to –Sn-OH stretching vibration due to hydrogen bonding. Optical absorption spectra of SnO2 powder revealed that SnO2 exhibits a shoulder at 202 nm along with an ill-defined band at 235 nm.

【 授权许可】

Unknown