Plasma Processing with Fluorine Chemistry for Modification of Surfaces Wettability

Molecules

卷:21

Gheorghe Dinescu¹  Maria Daniela Ionita¹  Sorin Vizireanu¹  Veronica Satulu¹  Bogdana Mitu¹ 

[1] National Institute for Lasers, Plasma and Radiation Physics, Atomistilor 409, Magurele-Bucharest, Ilfov 077125, Romania;

关键词: plasma processing;    fluorinated thin films;    nanostructured surfaces;    superhydrophobic surfaces;   

DOI  :  10.3390/molecules21121711

来源: DOAJ

【 摘 要 】

Using plasma in conjunction with fluorinated compounds is widely encountered in material processing. We discuss several plasma techniques for surface fluorination: deposition of fluorocarbon thin films either by magnetron sputtering of polytetrafluoroethylene targets, or by plasma-assisted chemical vapor deposition using tetrafluoroethane as a precursor, and modification of carbon nanowalls by plasma treatment in a sulphur hexafluoride environment. We showed that conformal fluorinated thin films can be obtained and, according to the initial surface properties, superhydrophobic surfaces can be achieved.

【 授权许可】

Unknown